Convex Optimization
Digital Image Processing (3rd Edition)
Digital Image Processing (3rd Edition)
THE LEADING EDGE OF PRODUCTION WAFER PROBE TEST TECHNOLOGY
ITC '04 Proceedings of the International Test Conference on International Test Conference
Design for Manufacturability and Statistical Design: A Comprehensive Approach
Design for Manufacturability and Statistical Design: A Comprehensive Approach
Proceedings of the 2006 IEEE/ACM international conference on Computer-aided design
IEEE Transactions on Signal Processing
Proceedings of the 2009 International Conference on Computer-Aided Design
Analyzing the impact of process variations on parametric measurements: novel models and applications
Proceedings of the Conference on Design, Automation and Test in Europe
Sparse signal reconstruction from limited data using FOCUSS: are-weighted minimum norm algorithm
IEEE Transactions on Signal Processing
IEEE Transactions on Information Theory
Statistical Timing Analysis: From Basic Principles to State of the Art
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Toward efficient spatial variation decomposition via sparse regression
Proceedings of the International Conference on Computer-Aided Design
Handling discontinuous effects in modeling spatial correlation of wafer-level analog/RF tests
Proceedings of the Conference on Design, Automation and Test in Europe
Automatic clustering of wafer spatial signatures
Proceedings of the 50th Annual Design Automation Conference
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In this paper, we propose a new technique, referred to as Multi-Wafer Virtual Probe (MVP) to efficiently model wafer-level spatial variations for nanoscale integrated circuits. Towards this goal, a novel Bayesian inference is derived to extract a shared model template to explore the wafer-to-wafer correlation information within the same lot. In addition, a robust regression algorithm is proposed to automatically detect and remove outliers (i.e., abnormal measurement data with large error) so that they do not bias the modeling results. The proposed MVP method is extensively tested for silicon measurement data collected from 200 wafers at an advanced technology node. Our experimental results demonstrate that MVP offers superior accuracy over other traditional approaches such as VP [7] and EM [8], if a limited number of measurement data are available.