A scalable quantitative measure of IR-drop effects for scan pattern generation

Authors:
M.-F. Wu;Kun-Han Tsai;Wu-Tung Cheng;H.-C. Pan;Jiun-Lang Huang;Augusli Kifli
Affiliations:
National Taiwan University, Taipei, Taiwan;Mentor Graphics Corporation, Wilsonville, OR;Mentor Graphics Corporation, Wilsonville, OR;National Taiwan University, Taipei, Taiwan;National Taiwan University, Taipei, Taiwan;Faraday Technology Corporation, Hsinchu, Taiwan
Venue:
Proceedings of the International Conference on Computer-Aided Design
Year:
2010

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Abstract

Analysis of power grid IR-drop during scan test application has drawn growing attention because excessive IR-drop may cause a functionally correct device to fail at-speed testing. The analysis is challenging since the power grid IR-drop profile depends on not only the switching cells locations but also the power grid structure. This paper presents a scalable implementation methodology for quantifying the IR-drop effects of a set of switching cells. An example of its application to guide power-safe scan pattern generation is illustrated. The scalability and effectiveness of the proposed quantitative measure is evaluated with a 130 nm industrial design with 800 K cells.