An efficient method for gradient-aware dummy fill synthesis

Authors:
Peng Wu;Hai Zhou;Changhao Yan;Jun Tao;Xuan Zeng
Affiliations:
State Key Laboratory of ASIC & System, Microelectronics Department, Fudan University, China;State Key Laboratory of ASIC & System, Microelectronics Department, Fudan University, China and EECS, Northwestern University, USA;State Key Laboratory of ASIC & System, Microelectronics Department, Fudan University, China;State Key Laboratory of ASIC & System, Microelectronics Department, Fudan University, China;State Key Laboratory of ASIC & System, Microelectronics Department, Fudan University, China
Venue:
Integration, the VLSI Journal
Year:
2013

Citing 13
Cited 0

Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability

Proceedings of the 37th Annual Design Automation Conference
Practical iterated fill synthesis for CMP uniformity

Proceedings of the 37th Annual Design Automation Conference
Monte-Carlo algorithms for layout density control

ASP-DAC '00 Proceedings of the 2000 Asia and South Pacific Design Automation Conference
Closing the smoothness and uniformity gap in area fill synthesis

Proceedings of the 2002 international symposium on Physical design
Investigation of the capacitance deviation due to metal-fills and the effective interconnect geometry modeling

ISQED '03 Proceedings of the 4th International Symposium on Quality Electronic Design
Mask distortion issues for next-generation lithography

Microelectronic Engineering - Proceedings of the symposium and summer school on: Nano and Giga challenges in microelectronics research and opportunities in Russia
A fast approximation scheme for fractional covering problems with variable upper bounds

SODA '04 Proceedings of the fifteenth annual ACM-SIAM symposium on Discrete algorithms
Provably good and practically efficient algorithms for CMP dummy fill

Proceedings of the 46th Annual Design Automation Conference
Density gradient minimization with coupling-constrained dummy fill for CMP control

Proceedings of the 19th international symposium on Physical design
Filling algorithms and analyses for layout density control

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
An efficient approach to multilayer layer assignment with an application to via minimization

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Compressible area fill synthesis

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Fast Dummy-Fill Density Analysis With Coupling Constraints

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

Quantified Score

Hi-index	0.00

Visualization

Abstract

In advanced VLSI fabrication, dummy fill is widely employed to solve the pattern dependent manufacturability issues. In this paper, a new linear programming formulation for dummy fill synthesis is proposed, which takes more consideration to the density gradient besides the pattern density. Based on the covering linear programming (CLP), a fast iterative approximation scheme is designed to solve this newly formulated problem. The complexity of the new method is proved to be O(n^2log(n)). Experimental results demonstrate the effectiveness of the new formulation, and show good accuracy and time efficiency of the proposed method. Compared with the ordinary LP method, speedup over magnitude is achieved with the acceptable overfill amount.