Operation and modeling of the MOS transistor
Operation and modeling of the MOS transistor
Numerical recipes in C: the art of scientific computing
Numerical recipes in C: the art of scientific computing
Global design of analog cells using statistical optimization techniques
Analog Integrated Circuits and Signal Processing - Special issue on analog signal processing
Characterization of subthreshold MOS mismatch in transistors for VLSI systems
Analog Integrated Circuits and Signal Processing - Joint special issue on analog VLSI computation
Mismatch Characterization of Submicron MOS Transistors
Analog Integrated Circuits and Signal Processing
Analog Integrated Circuits and Signal Processing
On mismatch in the deep sub-micron era - from physics to circuits
Proceedings of the 2004 Asia and South Pacific Design Automation Conference
Analog Integrated Circuits and Signal Processing
State-dependent computation using coupled recurrent networks
Neural Computation
A weak-to-strong inversion mismatch model for analog circuit design
Analog Integrated Circuits and Signal Processing
The Case for Analog Circuit Verification
Electronic Notes in Theoretical Computer Science (ENTCS)
A CMOS current-mode dynamic programming circuit
IEEE Transactions on Circuits and Systems Part I: Regular Papers - Special section on 2009 IEEE system-on-chip conference
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This paper presents a methodology for characterizing the random component of transistor mismatch in CMOS technologies. The methodology is based on the design of a special purpose chip which allows automatic characterization of arrays of NMOS and PMOS transistors of different sizes. Up to 30 different transistor sizes were implemented in the same chip, with varying transistors width W and length L. A simple strong inversion large signal transistor model is considered, and a new five parameters MOS mismatch model is introduced. The current mismatch between two identical transistors is characterized by the mismatch in their respective current gain factors Δβ/β, threshold voltages \Delta V_{T0}, bulk threshold parameters Δγ, and two components for the mobility degradation parameter mismatch \Delta \theta_{o} and \Delta \theta_{e}. These two components modulate the mismatch contribution differently, depending on whether the transistors are biased in ohmic or in saturation region. Using this five parameter mismatch model, an extraordinary fit between experimental and computed mismatch is obtained, including minimum length (1 μm) transistors for both ohmic and saturation regions. Standard deviations for these five parameters are obtained as well as their respective correlation coefficients, and are fitted to two dimensional surfaces f(W, L) so that their values can be predicted as a function of transistor sizes. These functions are used in an electrical circuit simulator (Hspice) to predict transistor mismatch. Measured and simulated data are in excellent agreement.