Efficient Critical Area Algorithms and Their Application to Yield Improvement and Test Strategies
Proceedings of the The IEEE International Workshop on Defect and Fault Tolerance in VLSI Systems
An O (N log N) algorithm for Boolean mask operations
DAC '81 Proceedings of the 18th Design Automation Conference
Interviews: A C++ graphical interface toolkit
Interviews: A C++ graphical interface toolkit
Modeling of integrated circuit defect sensitivities
IBM Journal of Research and Development
Yield modeling and BEOL fundamentals
Proceedings of the 2001 international workshop on System-level interconnect prediction
Pre-layout prediction of interconnect manufacturability
Proceedings of the 2001 international workshop on System-level interconnect prediction
Prelayout interconnect yield prediction
IEEE Transactions on Very Large Scale Integration (VLSI) Systems - Special section on system-level interconnect prediction (SLIP)
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A software tool to extract critical areas from commercial IC mask data is reported. The EYE (Edinburgh Yield Estimator) tool uses fast O(NlogN) critical area algorithms and is able to perform operations hierarchically making it suitable for use on large devices. The tool has applications in yield prediction, optimising the manufacturability of IC layout, and the generation of defect sensitivity visualisation aids in the form of fault probability maps.