Input and transistor reordering for NBTI and HCI reduction in complex CMOS gates

  • Authors:
  • Saman Kiamehr;Farshad Firouzi;Mehdi B. Tahoori

  • Affiliations:
  • Karlsruhe Institute of Technology (KIT), Karlsruhe, Germany;Karlsruhe Institute of Technology (KIT), Karlsruhe, Germany;Karlsruhe Institute of Technology (KIT), Karlsruhe, Germany

  • Venue:
  • Proceedings of the great lakes symposium on VLSI
  • Year:
  • 2012

Quantified Score

Hi-index 0.00

Visualization

Abstract

As CMOS feature size scales to the nanometer regime, transistor aging mostly due to Negative Bias Temperature Instability (NBTI) and Hot Carrier Injection (HCI), has emerged as a major reliability concern. Threshold voltage shift causes the circuit to fail, once the post-aging delay exceeds the timing constraint. In this paper, we investigate the stacking effect of transistors on aging and propose a novel input/transistor reordering approach to alleviate the effect of NBTI and HCI during the active mode operation of the circuit. According to the results, the circuit failing due to aging effect is postponed by increasing the operational lifetime for ISCAS benchmarks by 23.6%, in average, while it has a negligible effect on delay, area, and power compared to the original cell input ordering.