New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout
Proceedings of the 2001 Asia and South Pacific Design Automation Conference
Optimal phase conflict removal for layout of dark field alternating phase shifting masks
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Fast and efficient phase conflict detection and correction in standard-cell layouts
ICCAD '05 Proceedings of the 2005 IEEE/ACM International conference on Computer-aided design
Layout decomposition for double patterning lithography
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Layout decomposition approaches for double patterning lithography
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems - Special issue on the 2009 ACM/IEEE international symposium on networks-on-chip
Fast and lossless graph division method for layout decomposition using SPQR-tree
Proceedings of the International Conference on Computer-Aided Design
Fast and scalable parallel layout decomposition in double patterning lithography
Integration, the VLSI Journal
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As feature sizes shrink, it will be necessary to use AAPSM (Alternating-Aperture Phase Shift Masking) to image critical features, especially on the polysilicon layer.This imposes additional constraints on the layouts beyond traditional design rules.Of particular note is the requirement that all critical features be flanked by opposite-phase shifters, while the shifters obey minimum width and spacing requirements.A layout is called phase-assignable if it satisfies this requirement.If a layout is not phase-assignable, the phase conflicts have to removed to enable the use of AAPSM for the layout.Previous work has sought to detect a suitable set of phase Conflicts to be removed, as well as correct them. The contribution of this paper are the following: (1) a new approach to detect a minimal set of phase conflicts (also referred to as AAPSM conflicts), which when corrected will produce a phase-assignable layout; (2) a novel layout modification scheme for correcting these AAPSM conflicts.The proposed approach for conflict detection shows significant improvements in the quality of results and runtime for real industrial circuits, when compared to previous methods.To the best of our knowledge, this is the first time layout modification results are presented for bright-field AAPSM. Our experiments show that the percentage area increase for making a layout phase-assignable ranges from 0.7-11.8%.