A linear-time heuristic for improving network partitions
DAC '82 Proceedings of the 19th Design Automation Conference
Bright-Field AAPSM Conflict Detection and Correction
Proceedings of the conference on Design, Automation and Test in Europe - Volume 2
Compression-based fixed-parameter algorithms for feedback vertex set and edge bipartization
Journal of Computer and System Sciences
Hybridizing the cross-entropy method: An application to the max-cut problem
Computers and Operations Research
Layout decomposition for double patterning lithography
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Double patterning technology friendly detailed routing
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Double patterning layout decomposition for simultaneous conflict and stitch minimization
Proceedings of the 2009 international symposium on Physical design
Double patterning lithography friendly detailed routing with redundant via consideration
Proceedings of the 46th Annual Design Automation Conference
Simultaneous layout migration and decomposition for double patterning technology
Proceedings of the 2009 International Conference on Computer-Aided Design
GREMA: graph reduction based efficient mask assignment for double patterning technology
Proceedings of the 2009 International Conference on Computer-Aided Design
A matching based decomposer for double patterning lithography
Proceedings of the 19th international symposium on Physical design
Layout decomposition approaches for double patterning lithography
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems - Special issue on the 2009 ACM/IEEE international symposium on networks-on-chip
A parallel integer programming approach to global routing
Proceedings of the 47th Design Automation Conference
Multi-threaded collision-aware global routing with bounded-length maze routing
Proceedings of the 47th Design Automation Conference
Double patterning lithography aware gridless detailed routing with innovative conflict graph
Proceedings of the 47th Design Automation Conference
Parallel hierarchical cross entropy optimization for on-chip decap budgeting
Proceedings of the 47th Design Automation Conference
Proceedings of the 2010 Asia and South Pacific Design Automation Conference
Post-routing layer assignment for double patterning
Proceedings of the 16th Asia and South Pacific Design Automation Conference
A Special Section on Multicore Parallel CAD: Algorithm Design and Programming
ACM Transactions on Design Automation of Electronic Systems (TODAES)
Flexible 2D layout decomposition framework for spacer-type double pattering lithography
Proceedings of the 48th Design Automation Conference
WISDOM: wire spreading enhanced decomposition of masks in double patterning lithography
Proceedings of the International Conference on Computer-Aided Design
Fast and lossless graph division method for layout decomposition using SPQR-tree
Proceedings of the International Conference on Computer-Aided Design
Native-conflict-aware wire perturbation for double patterning technology
Proceedings of the International Conference on Computer-Aided Design
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For 32/22nm technology nodes and below, double patterning (DP) lithography has become the most promising interim solutions due to the delay in the deployment of next generation lithography (e.g., EUV). DP requires the partitioning of the layout patterns into two different masks, a procedure called layout decomposition. Layout decomposition is a key computational step that is necessary for double patterning technology. Existing works on layout decomposition are all single-threaded, which is not scalable in runtime and/or memory for large industrial layouts. This paper presents the first window-based parallel layout decomposition methods for improving both runtime and memory consumption. Experimental results are promising and show the presented parallel layout decomposition methods obtain upto 21x speedup in runtime and upto 7.5xreduction in peak memory consumption with acceptable solution quality.