Combinatorial optimization
New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout
Proceedings of the 2001 Asia and South Pacific Design Automation Conference
Bright-Field AAPSM Conflict Detection and Correction
Proceedings of the conference on Design, Automation and Test in Europe - Volume 2
DFM issues for 65nm and beyond
Proceedings of the 17th ACM Great Lakes symposium on VLSI
An MILP-based wire spreading algorithm for PSM-aware layout modification
Proceedings of the 2008 Asia and South Pacific Design Automation Conference
Invited paper: Variability in nanometer CMOS: Impact, analysis, and minimization
Integration, the VLSI Journal
Parallelizing CAD: a timely research agenda for EDA
Proceedings of the 45th annual Design Automation Conference
Layout decomposition for double patterning lithography
Proceedings of the 2008 IEEE/ACM International Conference on Computer-Aided Design
Layout decomposition approaches for double patterning lithography
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems - Special issue on the 2009 ACM/IEEE international symposium on networks-on-chip
Fast and lossless graph division method for layout decomposition using SPQR-tree
Proceedings of the International Conference on Computer-Aided Design
Layout decomposition with pairwise coloring for multiple patterning lithography
Proceedings of the International Conference on Computer-Aided Design
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Alternating-aperture phase shift masking (AAPSM), a form of strong resolution enhancement technology (RET) is used to image critical features on the polysilicon layer at smaller technology nodes. This technology imposes additional constraints on the layouts beyond traditional design rules. Of particular note is the requirement that all critical features be flanked by opposite-phase shifters, while the shifters obey minimum width and spacing requirements. A layout is called phase-assignable if it satisfies this requirement. Phase conflicts between shifters have to be removed to enable the use of AAPSM for layouts that air not phase-assignable. Previous work has sought to detect a suitable set of phase conflicts to be removed, as well as correct them as well as correct them. This paper has two key contributions: (1) a new computationally efficient approach to detect a minimal set of phase conflicts, which when corrected produces a phase-assignable layout; (2) a novel layout modification scheme for correcting these phase conflicts in standard-cell blocks. Unlike previous formulations of this problem, the proposed solution for the conflict detection problem does not frame it as a graph bipartization problem. Instead, a simpler and more computationally efficient reduction is proposed. This simplification greatly improves the runtime, while maintaining the same improvements ill the quality of results. An average runtime speedup of 5.9/spl times/ is achieved using the new flow. A new layout modification scheme for correcting phase conflicts in large standard-cell blocks is also proposed. The proposed layout modification scheme can handle all phase conflicts in large standard-cell blocks with small increases in area. Our experiments show that the percentage area increase for making typical standard-cell blocks phase-assignable ranges from 3.4-9.1%.