OPC-free and minimally irregular IC design style

  • Authors:
  • W. Maly;Yi-Wei Lin;M. Marek-Sadowska

  • Affiliations:
  • CMU, Pittsburgh, PA;UC Santa Barbara, CA;UC Santa Barbara, CA

  • Venue:
  • Proceedings of the 44th annual Design Automation Conference
  • Year:
  • 2007

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Abstract

Advancements in IC manufacturing technologies allow for building very large devices with billions of transistors and with complex interactions between them encapsulated in a huge number of design rules. To ease designers' efforts in dealing with electrical and manufacturing problems, regular layout style seems to be a viable option. In this paper we analyze regular layouts in an IC manufacturability context and define their desired properties. We introduce the OPC-free IC design methodology and study properties of cells designed for this layout style that have various degrees of regularity.