Physical design CAD in deep sub-micron era

  • Authors:
  • T. Mitsuhashi;M. Murakata;K. Yoshida;T. Aoki

  • Affiliations:
  • Semiconductor DA & Test Engineering Center, TOSHIBA Corporation, 580-1, Horikawa-cho, Saiwai-ku, Kawasaki 210, Japan;Semiconductor DA & Test Engineering Center, TOSHIBA Corporation, 580-1, Horikawa-cho, Saiwai-ku, Kawasaki 210, Japan;Semiconductor DA & Test Engineering Center, TOSHIBA Corporation, 580-1, Horikawa-cho, Saiwai-ku, Kawasaki 210, Japan;Semiconductor DA & Test Engineering Center, TOSHIBA Corporation, 580-1, Horikawa-cho, Saiwai-ku, Kawasaki 210, Japan

  • Venue:
  • EURO-DAC '96/EURO-VHDL '96 Proceedings of the conference on European design automation
  • Year:
  • 1996

Quantified Score

Hi-index 0.00

Visualization

Abstract