A comparison of various terminal-gate relationships for interconnect prediction in VLSI circuits

  • Authors:
  • Joni Dambre;Peter Verplaetse;Dirk Stroobandt;Jan Van Campenhout

  • Affiliations:
  • ELIS Department, Ghent University, Ghent, Belgium;ELIS Department, Ghent University, Ghent, Belgium;ELIS Department, Ghent University, Ghent B-9000, Belgium;ELIS Department, Ghent University, Ghent, Belgium

  • Venue:
  • IEEE Transactions on Very Large Scale Integration (VLSI) Systems - Special section on system-level interconnect prediction (SLIP)
  • Year:
  • 2003

Quantified Score

Hi-index 0.00

Visualization

Abstract

Over the years, different interpretations of Rent's rule and different ways of estimating the Rent parameters have emerged. In general, these parameters are extracted from the average terminal-gate relationship for a set of circuit modules. We show that this relationship (the Rent characteristic) strongly depends on the definition of the circuit modules. These can be generated in many different ways, either from the topology of the circuit graph or, in a geometric way, by cutting regions from a circuit layout. The resulting Rent parameters can be quite far apart. This paper discusses the fundamental differences between the topological and the two geometric interpretations of the Rent characteristic that are expcted to be most appropriate for current wire-length estimation techniques. Our discussion is based on experimental data, as well as on a theoretical model that can be used to estimate certain geometric Rent charactristics from the topological Rent parameters. Using this model, we derive a theoretical lower limit to the value of the average geometric Rent exponent. we also study the impact of the placement approach and placement quality on the geometric Rent characteristics.