Duet: an accurate leakage estimation and optimization tool for dual-Vt circuits
IEEE Transactions on Very Large Scale Integration (VLSI) Systems
Parameter variations and impact on circuits and microarchitecture
Proceedings of the 40th annual Design Automation Conference
Topological Analysis for Leakage Prediction of Digital Circuits
ASP-DAC '02 Proceedings of the 2002 Asia and South Pacific Design Automation Conference
Efficient techniques for gate leakage estimation
Proceedings of the 2003 international symposium on Low power electronics and design
Leakage in nano-scale technologies: mechanisms, impact and design considerations
Proceedings of the 41st annual Design Automation Conference
Toward a systematic-variation aware timing methodology
Proceedings of the 41st annual Design Automation Conference
Selective gate-length biasing for cost-effective runtime leakage control
Proceedings of the 41st annual Design Automation Conference
Detailed placement for leakage reduction using systematic through-pitch variation
ISLPED '07 Proceedings of the 2007 international symposium on Low power electronics and design
A new approach to minimize leakage power in nano-scale VLSI adder
Proceedings of the International Conference and Workshop on Emerging Trends in Technology
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Leakage power is one of the most critical issues for ultra-deep submicron technology. Subthreshold leakage depends exponentially on linewidth, and consequently variation in linewidth translates to a large leakage variation. A significant fraction of variation in linewidth occurs due to systematic variations involving focus and pitch. In this paper we propose a new leakage estimation methodology that accounts for focus-dependent variation in linewidth. The ideas presented in this paper significantly improve leakage estimation and can be used in existing leakage reduction techniques to improve their efficacy. We modify the previously proposed gate length biasing technique of [9] to consider systematic variations in linewidth and further reduce leakage power. Our method reduces the leakage spread between worst and best process corners by up to 62%. Defocus awareness improves leakage reduction from gate length biasing by up to 7%