Dummy fill optimization for enhanced manufacturability

  • Authors:
  • Yaoguang Wei;Sachin S. Sapatnekar

  • Affiliations:
  • University of Minnesota, Minneapolis, MN, USA;University of Minnesota, Minneapolis, MN, USA

  • Venue:
  • Proceedings of the 19th international symposium on Physical design
  • Year:
  • 2010

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Abstract

This paper presents a router that minimizes the amount of dummy fill necessary to satisfy the requirements for chemical-mechanical polishing (CMP). The algorithm uses a greedy strategy and effective cost functions to control the maximal effective pattern density during routing. On a standard set of benchmark circuits, our CMP-aware router can reduce the required dummy fill by 22.0% on average, and up to 41.5%, as compared to the CMP-unaware case. In comparison with another CMP-aware routing approach, our algorithm is demonstrated to reduce the amount of dummy fill by 14.1% on average, and up to 23.6%, over the benchmarks.