Towards a framework for designing applications onto hybrid nano/CMOS fabrics

  • Authors:
  • Catherine Dezan;Ciprian Teodorov;Loïc Lagadec;Michael Leuchtenburg;Teng Wang;Pritish Narayanan;Andras Moritz

  • Affiliations:
  • LAB-STICC UMR 3192, Université de Bretagne Occidentale, France;LAB-STICC UMR 3192, Université de Bretagne Occidentale, France;LAB-STICC UMR 3192, Université de Bretagne Occidentale, France;Electrical and Computing Engineering Department, University of Massachusetts at Amherst, USA;Electrical and Computing Engineering Department, University of Massachusetts at Amherst, USA;Electrical and Computing Engineering Department, University of Massachusetts at Amherst, USA;Electrical and Computing Engineering Department, University of Massachusetts at Amherst, USA

  • Venue:
  • Microelectronics Journal
  • Year:
  • 2009

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Abstract

The design of CAD tools for nanofabrics involves new challenges not encountered with conventional design flow used for CMOS technology. In this paper, we propose to define a new framework able to help the designer to map an application on a wide range of emerging nanofabrics. Our proposal is based on a variety of models that capture as well as isolate the differences between these fabrics. This tool supports the design flow starting from behavioral description up to final layout. It integrates fault-tolerant techniques and fabric-related density transformations with more conventional design automation techniques. After an overview of common requirements, physical models, and associated techniques, a case study in the context of NASIC fabrics is used to illustrate some of the concepts.