Design rule checking and analysis of IC mask designs
DAC '76 Proceedings of the 13th Design Automation Conference
Fast algorithms for LSI artwork analysis
DAC '77 Proceedings of the 14th Design Automation Conference
A layout checking system for large scale integrated circuits
DAC '77 Proceedings of the 14th Design Automation Conference
CRITIC - an integrated circuit design rule checking program
DAC '74 Proceedings of the 11th Design Automation Workshop
MAP: A user-controlled automated Mask Analysis Program
DAC '74 Proceedings of the 11th Design Automation Workshop
Hierarchical analysis of IC artwork with user defined abstraction rules
DAC '85 Proceedings of the 22nd ACM/IEEE Design Automation Conference
MACH : a high-hitting pattern checker for VLSI mask data
DAC '83 Proceedings of the 20th Design Automation Conference
A set of programs for MOS design
DAC '81 Proceedings of the 18th Design Automation Conference
A concurrent pattern operation algorithm for VLSI mask data
DAC '81 Proceedings of the 18th Design Automation Conference
Efficient Boolean operations on IC masks
DAC '81 Proceedings of the 18th Design Automation Conference
An integrated mask artwork analysis system
DAC '80 Proceedings of the 17th Design Automation Conference
Unified Shapes Checker - a checking tool for LSI
DAC '79 Proceedings of the 16th Design Automation Conference
LSI layout checking using bipolar device recognition technique
DAC '79 Proceedings of the 16th Design Automation Conference
| Hi-index | 0.00 |
Bell-Northern Research has developed a program for design rule checking of integrated circuit masks, based on a one-dimensional scanning technique using a novel data coding scheme for efficient processing of large volumes of geometric data. The rule checking concept is very simple and the program is small and easily implemented. The technique is also extremely economical, costing less than $100 to apply 25 design checks to a high density 5200 µm square silicon gate n-channel mask. CPU time varies approximately as the power 1.2 of the amount of data in the mask.