Design rule checking and analysis of IC mask designs

  • Authors:
  • B. W. Lindsay;B. T. Preas

  • Affiliations:
  • -;-

  • Venue:
  • DAC '76 Proceedings of the 13th Design Automation Conference
  • Year:
  • 1976

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Abstract

An efficient method of producing logical combinations of integrated circuit (IC) masks in numerical form leads to a generalized design rule checking program. The union (OR), intersection (AND) and the complements, as well as topological classification and simple geometric operations, are provided through a set of LOGical MASk Checking (LOGMASC) commands, allowing the designer to construct, for the given IC technology, a tailored set of design rule checks. These range from simple tolerance checks to complex analysis of mask geometries based on pattern recognition.