A simple computer-aided artwork system that works
DAC '74 Proceedings of the 11th Design Automation Workshop
Fast algorithm for LSI artwork analysis
25 years of DAC Papers on Twenty-five years of electronic design automation
A layout checking system for large scale integrated circuits
25 years of DAC Papers on Twenty-five years of electronic design automation
An algorithm for design rule checking on a multiprocessor
DAC '85 Proceedings of the 22nd ACM/IEEE Design Automation Conference
Efficient Boolean operations on IC masks
DAC '81 Proceedings of the 18th Design Automation Conference
Design rule verification based on one dimensional scans
DAC '78 Proceedings of the 15th Design Automation Conference
The evolution of design automation to meet the challanges of VLSI
DAC '80 Proceedings of the 17th Design Automation Conference
SLEUTH - a metal-to-metal audit program in an interactive environment
DAC '76 Proceedings of the 13th Design Automation Conference
An integrated CAD data base system
DAC '75 Proceedings of the 12th Design Automation Conference
An artwork design verification system
DAC '75 Proceedings of the 12th Design Automation Conference
Fast algorithms for LSI artwork analysis
DAC '77 Proceedings of the 14th Design Automation Conference
A layout checking system for large scale integrated circuits
DAC '77 Proceedings of the 14th Design Automation Conference
A hardware assisted design rule check architecture
DAC '82 Proceedings of the 19th Design Automation Conference
LSI layout checking using bipolar device recognition technique
DAC '79 Proceedings of the 16th Design Automation Conference
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CRITIC is a production proven design rule checking program which can perform minimum width, minimum clearance, minimum enclosure and other geometrical relationship tests for artwork figures on one mask level or between different mask levels.