An explicit RC-circuit delay approximation based on the first three moments of the impulse response
DAC '96 Proceedings of the 33rd annual Design Automation Conference
Timing metrics for physical design of deep submicron technologies
ISPD '98 Proceedings of the 1998 international symposium on Physical design
PRIMO: probability interpretation of moments for delay calculation
DAC '98 Proceedings of the 35th annual Design Automation Conference
h-gamma: an RC delay metric based on a gamma distribution approximation of the homogeneous response
Proceedings of the 1998 IEEE/ACM international conference on Computer-aided design
PERI: a technique for extending delay and slew metrics to ramp inputs
Proceedings of the 8th ACM/IEEE international workshop on Timing issues in the specification and synthesis of digital systems
A delay metric for RC circuits based on the Weibull distribution
Proceedings of the 2002 IEEE/ACM international conference on Computer-aided design
Delay and slew metrics using the lognormal distribution
Proceedings of the 40th annual Design Automation Conference
Simple metrics for slew rate of RC circuits based on two circuit moments
Proceedings of the 40th annual Design Automation Conference
Interconnect Delay and Slew Metrics Using the First Three Moments
ISQED '05 Proceedings of the 6th International Symposium on Quality of Electronic Design
Electronic Circuit & System Simulation Methods (SRE)
Electronic Circuit & System Simulation Methods (SRE)
The Elmore delay as a bound for RC trees with generalized input signals
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
An analytical delay model for RLC interconnects
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
RC delay metrics for performance optimization
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
A delay metric for RC circuits based on the Weibull distribution
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
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Integrated circuit process technology is entering the ultra deep submicron era. At this level, interconnect structure becomes very stiff and the metal resistance shielding effects problem is more serious. Although several delay metrics have been proposed, they are inefficient and difficult to implement. Hence, we propose a new delay and slew metric for interconnect based on Beta distribution and which does not require a look-up table to be built. Our metrics are efficient and easy to implement; the overall standard deviation and error mean are smaller than in previous works.