IC mask layout with a single conductor layer

  • Authors:
  • Sheldon B. Akers;James M. Geyer;Donald L. Roberts

  • Affiliations:
  • General Electric Company, Syracuse, New York;General Electric Company, Syracuse, New York;General Electric Company, Syracuse, New York

  • Venue:
  • DAC '70 Proceedings of the 7th Design Automation Workshop
  • Year:
  • 1970

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Abstract

A computer program for the automatic layout of single conductor layer IC masks is described. Descriptions are included of element modelling, element placement, grid expansion, cross-over minimization, conductor routing and layout compaction.