SLIM-the translation of symbolic layouts into mask data

  • Authors:
  • A. E. Dunlop

  • Affiliations:
  • -

  • Venue:
  • DAC '80 Proceedings of the 17th Design Automation Conference
  • Year:
  • 1980

Quantified Score

Hi-index 0.00

Visualization

Abstract

A new form of symbolic layout for integrated circuits is coupled with a mask compaction procedure which removes excess space while guaranteeing that all design rules are met. Tradeoffs between X and Y compaction are made based on critical path information. Two types of compaction are used to minimize mask area and computer run-time. Additional procedures reduce mask area by inserting jogs at strategic locations in the layout. A partitioned data base is used to store mask data in a hierarchical manner. The symbolic layout and mask compaction procedures require only 30 to 50 percent of the time traditionally needed to do equivalent hand layouts.