Filling and slotting: analysis and algorithms
ISPD '98 Proceedings of the 1998 international symposium on Physical design
Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability
Proceedings of the 37th Annual Design Automation Conference
Practical iterated fill synthesis for CMP uniformity
Proceedings of the 37th Annual Design Automation Conference
The road to better reliability and yield embedded DFM tools
DATE '00 Proceedings of the conference on Design, automation and test in Europe
Monte-Carlo algorithms for layout density control
ASP-DAC '00 Proceedings of the 2000 Asia and South Pacific Design Automation Conference
Proceedings of the 2001 international symposium on Physical design
Hierarchical dummy fill for process uniformity
Proceedings of the 2001 Asia and South Pacific Design Automation Conference
Closing the smoothness and uniformity gap in area fill synthesis
Proceedings of the 2002 international symposium on Physical design
New and Exact Filling Algorithms for Layout Density Control
VLSID '99 Proceedings of the 12th International Conference on VLSI Design - 'VLSI for the Information Appliance'
Mini-Tutorial: IC Layout and Manufacturability: Critical Links and Design Flow Implications
VLSID '99 Proceedings of the 12th International Conference on VLSI Design - 'VLSI for the Information Appliance'
Area Fill Generation With Inherent Data Volume Reduction
DATE '03 Proceedings of the conference on Design, Automation and Test in Europe - Volume 1
ISQED '05 Proceedings of the 6th International Symposium on Quality of Electronic Design
Self-Compensating Design for Focus Variation
Proceedings of the 42nd annual Design Automation Conference
Filling algorithms and analyses for layout density control
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Area fill synthesis for uniform layout density
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Enhanced double via insertion using wire bending
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
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As the device shapes keep shrinking, the designs are more sensitive to manufacturing processes. In order to improve performance predictability and yield, mask layout uniformity/evenness is highly desired, and it is usually measured by the feature density with defined feasible range in manufacture process design rules. To address the density control problem, one fundamental problem is how to calculate density accurately and efficiently. In this paper, we propose a fast exact algorithm to identify the maximum density for a given layout. Compared with the existing exact algorithms, our algorithm reduces the running time from days/hours to a few minutes/seconds. And it is even faster than the existing approximate algorithms in literature.