Critical-path-aware X-filling for effective IR-drop reduction in at-speed scan testing

Authors:
Xiaoqing Wen;Kohei Miyase;Tatsuya Suzuki;Seiji Kajihara;Yuji Ohsumi;Kewal K. Saluja
Affiliations:
Kyushu Institute of Technology, lizuka, Japan;Kyushu Institute of Technology, lizuka, Japan;Kyushu Institute of Technology, lizuka, Japan;Kyushu Institute of Technology, lizuka, Japan;Hibikino R&D Center, Kitakyushu, Japan;University of Wisconsin -- Madison, Madison
Venue:
Proceedings of the 44th annual Design Automation Conference
Year:
2007

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Abstract

IR-drop-induced malfunction is mostly caused by timing violations on activated critical paths during the capture cycle of at-speed scan testing. A critical-path-aware X-filling method is proposed for reducing IR-drop, especially on gates that are close to activated critical paths, thus effectively preventing test-induced yield loss.