Simultaneous optimization of supply and threshold voltages for low-power and high-performance circuits in the leakage dominant era

  • Authors:
  • Anirban Basu;Sheng-Chih Lin;Vineet Wason;Amit Mehrotra;Kaustav Banerjee

  • Affiliations:
  • University of California, Santa Barbara, CA;University of California, Santa Barbara, CA;University of California, Santa Barbara, CA;Berkeley Design Automation Inc., Santa Clara, CA;University of California, Santa Barbara, CA

  • Venue:
  • Proceedings of the 41st annual Design Automation Conference
  • Year:
  • 2004

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Abstract

Electrothermal couplings between supply voltage, operating frequency, power dissipation and die temperature have been shown to significantly impact the energy-delay-product (EDP) based simultaneous optimization of supply (Vdd) and threshold (Vth) voltages. We present for the first time, the implications of an electrothermally aware EDP optimization on circuit operation in leakage dominant nanometer scale CMOS technologies. It is demonstrated that electrothermal EDP (EEDP) optimization restricts the operation of the circuit to a certain region in the Vdd-Vth plane. Also, the significance of EEDP optimization has been shown to increase with increase in leakage power and/or process variations.