An "effective" capacitance based delay metric for RC interconnect

  • Authors:
  • Chandramouli V. Kashyap;Charles J. Alpert;Anirudh Devgan

  • Affiliations:
  • IBM Corp., Austin, TX;IBM Corp., Austin, TX;IBM Corp., Austin, TX

  • Venue:
  • Proceedings of the 2000 IEEE/ACM international conference on Computer-aided design
  • Year:
  • 2000

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Abstract

Efficient, yet accurate delay estimation for RC interconnect is required for the optimization loop of timing-driven physical design tools. For many applications, the Elmore delay metric [4] has been widely used due to its efficiency and ease of use. However, it is well known that the Elmore metric can have significant error since it ignores the resistive shielding of down-stream capacitance. We present a new interconnect metric called ECM that accounts for this resistive shielding by computing an effective capacitance to model the downstream capacitance. ECM can also be computed with the same complexity as the Elmore delay and does not require the computation of moments. Experiments show that ECM is significantly more accurate than Elmore delay and is competitive with other metrics that use multiple moments.