Statistical circuit optimization considering device andinterconnect process variations

  • Authors:
  • I-Jye Lin;Tsui-Yee Ling;Yao-Wen Chang

  • Affiliations:
  • National Taiwan University, Taipei, Taiwan Roc;National Taiwan University, Taipei, Taiwan Roc;National Taiwan University, Taipei, Taiwan Roc

  • Venue:
  • Proceedings of the 2007 international workshop on System level interconnect prediction
  • Year:
  • 2007

Quantified Score

Hi-index 0.00

Visualization

Abstract

Process Variation has become a crucial challenge on both interconnect delay and reliability of nanometer integrated circuit designs. Furthermore, the dramatic increase of power consumption and integration density has led to high operating temperature. Temperature, as well as electromigration (EM) and power, also significantly affects the delay and reliability of interconnects. Considering process variation, we present the first work to use statistical methods to optimize the circuit area under timing, thermal and power constraints by gate and interconnect sizing optimization. We model the problem as a second-order conic program and solve it with the interior-point method. Experimental results show that our statistical algorithm can find desired solutions that satisfy all delay, power, and thermal constraints. Our statistical algorithm on average improves the circuit areas by respective 51.12%, 39.21%, and 25.60% with 70%, 84.1%, and 99.9% yields after wire and gate sizing.