Novel sizing algorithm for yield improvement under process variation in nanometer technology

  • Authors:
  • Seung Hoon Choi;Bipul C. Paul;Kaushik Roy

  • Affiliations:
  • Intel Corporation, Hillsboro, OR;Purdue University, W. Lafayette, IN;Purdue University, W. Lafayette, IN

  • Venue:
  • Proceedings of the 41st annual Design Automation Conference
  • Year:
  • 2004

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Abstract

Due to process parameter variations, a large variability in circuit delay occurs in scaled technologies affecting the yield. In this paper, we propose a sizing algorithm to ensure the speed of a circuit under process variation with a certain degree of confidence while maintaining the area and power budget within a limit. This algorithm estimates the variation in circuit delay using statistical timing analysis considering both inter- and intra-die process variation and resizes the circuit to achieve a desired yield. Experimental results on several benchmark circuits show that one can achieve up to 19% savings in area (power) using our algorithm compared to the worst-case design.