Accurate PTV, state, and ABB aware RTL blackbox modeling of subthreshold, gate, and PN-Junction leakage

  • Authors:
  • Domenik Helms;Marko Hoyer;Wolfgang Nebel

  • Affiliations:
  • OFFIS Research Institute;OFFIS Research Institute;University of Oldenburg, Oldenburg, Germany

  • Venue:
  • PATMOS'06 Proceedings of the 16th international conference on Integrated Circuit and System Design: power and Timing Modeling, Optimization and Simulation
  • Year:
  • 2006

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Abstract

We present a blackbox approach to model leakage currents of RTL data-path components. The model inputs are temperature, VDD, body voltage of NMOS and PMOS and the bitvector at the input. Additionally, the model accepts a statistical Gaussian variation introduced by intra-die and systematic variation introduced by inter-die. Both variations can be given independently for each BSIM-level process parameter; in this work we evaluate variation of channel length, gate-oxide thickness and channel doping. Model output is the sum of subthreshold, gate, and pn-junction leakage. The evaluation of an RT component can be done in milliseconds and the result for the 45nm and 65nm BPTM technology is within 2% against single BSIM4.40 evaluation and within 5% against statistical BSIM4.40 evaluation assuming 1% variation of the process parameters.