Modeling and minimization of interconnect energy dissipation in nanometer technologies

  • Authors:
  • Clark N. Taylor;Sujit Dey;Yi Zhao

  • Affiliations:
  • Department of Electrical and Computer Engineering, University of California, San Diego;Department of Electrical and Computer Engineering, University of California, San Diego;Department of Electrical and Computer Engineering, University of California, San Diego

  • Venue:
  • Proceedings of the 38th annual Design Automation Conference
  • Year:
  • 2001

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Abstract

As the technology sizes of semiconductor devices continue to decrease, the effect of nanometer technologies on interconnects, such as crosstalk glitches and timing variations, become more significant. In this paper, we study the effect of nanometer technologies on energy dissipation in interconnects. We propose a new power estimation technique which considers DSM effects, resulting in significantly more accurate energy dissipation estimates than transition-count based methods for on-chip interconnects. We also introduce an energy minimization technique which attempts to minimize large voltage swings across the cross-coupling capacitances between interconnects. Even though the number of transitions may increase, our method yields a decrease in power consumption of up to 50%.