Design and CAD Challenges in sub-90nm CMOS Technologies

  • Authors:
  • Kerry Bernstein;Ching-Te Chuang;Rajiv Joshi;Ruchir Puri

  • Affiliations:
  • IBM Thomas J Watson Research Center, Yorktown Hts, NY;IBM Thomas J Watson Research Center, Yorktown Hts, NY;IBM Thomas J Watson Research Center, Yorktown Hts, NY;IBM Thomas J Watson Research Center, Yorktown Hts, NY

  • Venue:
  • Proceedings of the 2003 IEEE/ACM international conference on Computer-aided design
  • Year:
  • 2003

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Abstract

This paper discusses design challenges of scaled CMOS circuits insub-90nm technologies for high-performance digital applications.To continue scaling of the CMOS devices deep into sub-90nm tech-nologies,fully depleted SOI, strained-Si on SiGe, FinFETs withdouble gate, and even further, three-dimensional circuits will be uti-lizedto design high-performance circuits. We will discuss uniquedesign aspects and issues resulting from this scaling such as gate-to-body tunneling, self-heating, reliability issues, and process vari-ations.As the scaling approaches various physical limits, new SOIdesign issues such as Vt modulation due to leakage, low-voltageimpact ionization, and higher V{t,lin} to maintain adequate V{t,sat},continue to surface.With an eye towards the future, design andCAD issues related to sub-65nm device structures such as doublegate FinFET will be discussed.