Interconnects in the third dimension: design challenges for 3D ICs

  • Authors:
  • Kerry Bernstein;Paul Andry;Jerome Cann;Phil Emma;David Greenberg;Wilfried Haensch;Mike Ignatowski;Steve Koester;John Magerlein;Ruchir Puri;Albert Young

  • Affiliations:
  • IBM T.J. Watson Research Center, Yorktown Heights, NY;IBM T.J. Watson Research Center, Yorktown Heights, NY;IBM Microelectronics, Essex Junction, VT;IBM T.J. Watson Research Center, Yorktown Heights, NY;IBM T.J. Watson Research Center, Yorktown Heights, NY;IBM T.J. Watson Research Center, Yorktown Heights, NY;IBM T.J. Watson Research Center, Yorktown Heights, NY;IBM T.J. Watson Research Center, Yorktown Heights, NY;IBM T.J. Watson Research Center, Yorktown Heights, NY;IBM T.J. Watson Research Center, Yorktown Heights, NY;IBM T.J. Watson Research Center, Yorktown Heights, NY

  • Venue:
  • Proceedings of the 44th annual Design Automation Conference
  • Year:
  • 2007

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Abstract

Despite generation upon generation of scaling, computer chips have until now remained essentially 2-dimensional. Improvements in on-chip wire delay and in the maximum number of I/O per chip have not been able to keep up with transistor performance growth; it has become steadily harder to hide the discrepancy. 3D chip technologies come in a number of flavors, but are expected to enable the extension of CMOS performance. Designing in three dimensions, however, forces the industry to look at formerly-two-dimensional integration issues quite differently, and requires the re-fitting of multiple existing EDA capabilities.