Modeling and minimization of PMOS NBTI effect for robust nanometer design

  • Authors:
  • Rakesh Vattikonda;Wenping Wang;Yu Cao

  • Affiliations:
  • ASU, Tempe, AZ;ASU, Tempe, AZ;ASU, Tempe, AZ

  • Venue:
  • Proceedings of the 43rd annual Design Automation Conference
  • Year:
  • 2006

Quantified Score

Hi-index 0.00

Visualization

Abstract

Negative bias temperature instability (NBTI) has become the dominant reliability concern for nanoscale PMOS transistors. In this paper, a predictive model is developed for the degradation of NBTI in both static and dynamic operations. Model scalability and generality are comprehensively verified with experimental data over a wide range of process and bias conditions. By implementing the new model into SPICE for an industrial 90nm technology, key insights are obtained for the development of robust design solutions: (1) the most effective techniques to mitigate the NBTI degradation are VDD tuning, PMOS sizing, and reducing the duty cycle; (2) an optimal VDD exists to minimize the degradation of circuit performance; (3) tuning gate length or the switching frequency has little impact on the NBTI effect; (4) a new switching scenario is identified for worst case timing analysis during NBTI stress.